CHEMISTRY

The chemistry area gathers several means involving concentrated liquid chemicals. Therefore, safety is of utmost importance in this area.

The area is made of 14 working stations with fume exhaust fitted out with deionised water spread out on 34 m² under class 100

In this area there are glassware; stirrers including magnetic and heated ones; hot plates; ultrasonic bathes quartz regulated heating bathes and spin/rinse dryers for silicon wafers. In addition, there is an optical microscope in the chemistry area.

The chemistry area is under controlled free access. Anyone who wants to work in this area must be aware of the risks inherent with the use of hazardous chemicals (concentrated mineral acids, strong oxidizers, volatile organic solvents and other toxic chemicals) and must know how to protect themselves and there colleagues from theses hazards. What more, everyone in the area must know how to prevent cross contamination between the various technologies involved.

Every facility in the area is under controlled free access

Equipments :

1 workstation for RCA and piranha cleaning 4 inches batch

1 workstation for RCA and piranha cleaning 6 inches batch

1 workstation for GaAS

1 workstation for single wafer MOS technology

2 workstations for the use of volatile organic solvents and organic materials

1 workstation for batch etching of SiO₂ MOS compatible

4 workstations for acid materials etching

1 resist stripping workstation with sonically agitated heated organic stripper bathes

1 single wafer spin dryer

1 4 inches wafers Semitool spin rinse dryer

1 6 inches wafers Semitool spin rinse dryer

Staff :

Jean-Baptiste DOUCET (Engineer Assistant - Area Responsible)

Fabien MESNILGRENTE (Engineer Assistant)

Know-How :

Wet etching without or with resist mask of

- metals (Au, Al, Ti, Cr Ni….)

- silicon oxyde, silicon nitride, strontium fluoride….

Wafer Cleaning :

RCA, piranha,

Solvent,(acetone ethanol, IPA, trichloroethylene

Surface treatment (n-octadecyltrichlorosilane)

Materials synthesis trough sol-gel technology