CHARACTERIZATION

The equipments available in the clean room are dedicated to the study and validation of technologicals steps for fabrication of componants.

When acheived the componants are characterized in the characterization platform.

Equipments :
AFM with SCM and SSRM modules free access after formation
SEM Hitachi S4800 with EDX system free access after formation
Mechanical profilometer KLA TencorP10 free access after formation
Mechanical profilometer KLA TencorP1 free access after formation
Optical profilometer Veeco free access after formation
Horiba Jobin Yvon Ellipsometer controled access
Resistivity measurements free access after formation
contact angle and surface energy measurements free access after formation
Direct writing laser metrology ( Mask fabrication Area)	Heidelberg DWL 200

Staff :

Responsibles of equipments : Monique DILHAN (research Engineer)  AFM Véronique CONEDERA (research Engineer) Profilometers, Microscopes , contact angle Franck CARCENAC (research Engineer) SEM Bernard ROUSSET (research Engineer)  Ellipsometer, Résistivimeter Pierre-François CALMON (research Engineer) DWL Metrology  Formators : Emmanuelle DARAN (research Engineer) (AFM) Laurent MAZENQ (Engineer Assistant) (SEM, Profilometers, Microscopes ) Laurent BOUSCAYROL (Engineer Assistant) (Ellipsometer, Resistivimeter) David BOURRIER (Engineer Assistant) (Profilometers) Jean-Baptiste DOUCET (Engineer Assistant) (Profilometers) David COLIN (Technician Assistant) (Profilometers, microscopes )

Know-How :
Various scales observations, physical characterization of materials, topography, surface characterization
AFM picture of a photonic cristal	AFM picture of a membrane
3D topography using optical profilometer