Nanoimprint 

The Nanoimprint zone is in the course of creation. The technique used is based on the replication in a UV sensitive resin, of patterns on a transparent mold. The patterns on the glass mold are generally realized by Electronic Lithography andor by photolithography, followed by a transfer by etching (ICP-RIE) in the glass.

Equipments :
NanoImprint Lithography on EVG 620 equipment UV-NIL and Micro Contact Printing Hard mold (glass) and soft mold (PDMS) Imprinted surface : Ø 1cm²

Staff :

Emmanuelle DARAN (Research Engineer - Area responsible) Laurent JALABERT (Research Engineer) Jean-Baptiste DOUCET (Engineer assistant) Franck CARCENAC (Research Engineer)

Know-How :

1-UV-NIL template fabrication: : Electronic Lithography on 4 inches glass wafer ICP-RIE etching on glass (100nm) Résolution : 40nm with a pitch of 100nm Imprinted surface :  1cm² anti-sticking treatment (wet method) UV-NIL template     2-UV Nanoimprint : surface treatment of substrates resist :  AMONIL and MRT Résolution : 40nm 3-Micro-Contact Printing : in study